Chip Failure Analysis with the Quantum Diamond Microscope

Magnetic field imaging – non-destructive, precise, and depth-independent

Modern technology nodes and advanced packaging significantly increase the complexity of failure analysis. Conventional methods often reach their limits in this context. At Fraunhofer EMFT, researchers are working on new approaches, including the use of a wide-field quantum diamond microscope from Quantum Diamonds. This new failure analysis method relies on nitrogen defects in diamond, which are used as magnetic field sensors. Since every current flow generates a magnetic field, the measured magnetic field signature allows current flows in microchips to be visualized.

Quantum diamond microscope
© Fraunhofer EMFT/ Bernd Müller
Examining microchips using a Quantum Diamond Microscope

Beyond Optical Limits – Detecting Hidden Faults with Magnetic Fields

The direct visualization of current flows opens up new possibilities in failure analysis - particularly in terms of precise fault localization. While conventional methods are typically based on indirect parameters, such as heat (lock-in thermography) or changes in resistance caused by laser irradiation (OBIRCH), quantum diamond microscopy offers a fundamentally expanded approach. Since it detects magnetic fields, no optical access is required. This allows even defects in deep layers of complex chips or chip stacks to be reliably localized. In addition, defects become visible that do not generate a measurable signal with other methods - such as low-resistance short circuits without sufficient heat emission. Open circuits can also be precisely identified. 

Quantum Diamond microscope current density
© M. Garsi et al., Quantum diamond microscopy for semiconductor failure analysis, EDFAAO 1:18-25 (2025)
Current flow in a commercially available microchip, reconstructed from magnetic field data.
Magnetic field signature under a quantum diamond microscope
© Quantum diamond microscopy for semiconductor failure analysis, EDFAAO 1:18-25 (2025)
Magnetic field signature of a commercial microchip, measured using a quantum diamond microscope

The range of applications extends from circuit testing and precise defect identification and localization to novel, non-destructive methods for authenticity and security analysis. 

At Fraunhofer EMFT, the team is continuously advancing the applications of the quantum diamond microscope to expand failure analysis capabilities for complex cases and state-of-the-art chip technologies. In addition, the researchers are also investigating applications in the field of hardware security.

 

Do you have a specific failure analysis case, or would you like to learn more about the method? Get in touch with us!

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