PECVD cleaning plasma with environmentally friendly and CFC-free "Solvaclean®N" fluorine chemistry
Many plasma coating systems used in the semiconductor industry have to undergo thorough cleaning on a regular basis after each stage of production. Currently this is mainly carried out using perfluorinated compounds (PFCs) and nitrogen trifluoride (NF3) gases, which are up to 17,000 times as damaging to the environment and climate as the greenhouse gas CO2. Solvay, Texas Instruments, Muegge and Fraunhofer EMFT are working on the project ecoFluor to develop an environment-friendly alternative which only has the greenhouse potential of CO2: the gas mixture used by the cooperation partners – Solvaclean®, consisting of fluorine, nitrogen and argon – dispenses entirely with the highly environmentally harmful gases PFCs and NF3.
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